2nd International Symposium on Anodizing Science and Technology (AST2014)

June 4-6, 2014, Chateraise Gateaux Kingdom Sapporo Hotel & Spa Resort, Sapporo, Hokkaido, Japan

Group shot (preview image). Thank you very much for your important contribution!
See you again next AST Symposium!

AST2014 BEST POSTER AWARDS
Congratulations!

Study of Anodic and Thermal Oxides Formed on Aluminum Alloy Surfaces
Jonas Evertsson (Lund University), Fan Zhang, Florian Bertram, Lisa Rullik, Mikhail Shipilin, Lindsay Richard Merte, Edvin Lundgren, Jinshan Pan
Porous-alumina-assisted Formation of Columnlike Nanostructured Anodic Films on a Nitrogen-doped Titanium Layer
Maria Bendova (Brno University of Technology), Jaromir Hubalek, and Alexander Mozalev
Control the Pore Size of AAO Templates for Electrochemical Capacitors
Jin-Kwon Choi (Chungbuk National University), Soo-Gil Park, Hong-Il Kim, Dal-Woo Shin, Sung-Han Kim, Moon-Su Lee, Hiroki Habazaki
Fabrication of Superoleophobic Hierarchical Surfaces on Aluminum by Chemical Etching and Anodizing
Katsutoshi Nakayama (Hokkaido University), Etsushi Tsuji, Yoshitaka Aoki, and Hiroki Habazaki
Fabrication of InP Line Pattern by Metal Assisted Chemical Etching under UV Irradiation
Yuta Suzuki (Kogakuin University), Hidetaka Asoh and Sachiko Ono
Habazaki’s Camera
https://plus.google.com/u/0/photos/110402050402467258347/albums/6022354151698119121
Kikuchi’s Camera
https://plus.google.com/u/0/photos/101808416666323112183/albums/6037640695002464497

Organized by

Anodizing Research Society(ARS), The Surface Finishing Society of Japan

Sponsored by

International Society of Electrochemistry(ISE)
Tokyo Ohka Foundation for The Promotion of Science and Technology

Download: Last Minute Information (May 22, PDF)

Due to the success of the 1st International Symposium, AST2008, the Anodizing Research Society (ARS) is proud to announce the 2nd International Symposium on Anodizing Science and Technology (AST2014), which will be held at Chateraise Gateaux Kingdom Sapporo Hotel & Spa Resort, Sapporo, Japan from June 4th (Wed.) to 6th (Fri.) 2014. The international symposium provides a forum for exchange ideas and latest results among those in academia and industry who are interested in anodizing science and technology.

Download: Call for Papers (PDF)

Symposium topics include but not limited to:

  1. Fundamental understanding of formation, structure and properties of anodic oxides on various metals.
  2. Control of structure and morphology of anodic oxides
  3. Self-organization of porous and nanotubular oxide films on aluminum and other metals.
  4. High resolution analysis of anodic oxide films
  5. Micro- and nano-technologies of anodic oxides
  6. Various applications of anodic oxides, including capacitors, catalysis, photocatalysis and corrosion protection
  7. Science and technology related to anodizing; electrochemical etching and polishing, passivity, electrochemical energy storage and conversion

Download: How to get the way to AST2014 (May 22, PDF)

The symposium will be held at Chateraise Gateaux Kingdom Sapporo Hotel & Spa Resort, Sapporo, Hokkaido, Japan. Sapporo, the prefectural capital of Hokkaido with a population of approximately two millions, is the gateway of tourism in Hokkaido.

Access map

Chateraise Gateaux Kingdom Sapporo Hotel & Spa Resort
http://www.gateauxkingdom.com/en/
132 Higashi Barato, Kita-ku, Sapporo, 002-8043, Japan
Tel: +81-11-773-2211

A Photo of the venue.

A Photo of the venue.

AST2014 Welcomes 100 Anodizing Presentations.

Download: Update program (May 8, PDF)

Download: Excursion (PDF)

The technical program will include plenary, keynote lectures, invited and contributed oral presentations as well as contributed poster presentations.

The official language of the symposium is English.

Invited Speakers (as of April. 28, 2014)

Opening Plenary Lecture:

Patrik Schmuki (University of Erlangen, Germany)
TiO2 Nanotubes: Recent Structures and Applications

Keynote:

Kurt R. Hebert (Iowa State University, USA)
Morphological Instability Leading to Formation of Porous Anodic Oxides
Herman Terryn (Free University Brussel, Bergium)
Post Processing of Anodic Oxide Films on Al: Interaction of Al Oxides with Organic and Inorganic Coatings
Ken Shimizu (Keio University & i-SEM laboratory, Japan)
Seeing is believing
Francesco di Quarto (Palermo University, Italy)
Physico-chemical properties of anodic oxide films: from passivity to electronics

Invited:

Kemal Nisancioglu (Norwegian University of Science and Technology, Norway)
In situ optical and electrochemical study of low temperature oxide growth and dissolution on aluminum in aqueous media
Achim W. Hassel (Johannes Kepler University, Austria)
Anodisation in 3D-Printed Electrochemical Cells
Monica Santamaria (Palermo University, Italy)
Effect of incorporation of foreign species on the solid state properties of anodic films on Ti
Soo-Gil Park (Chungbuk National University, Korea)
Energy storage system with Anodizing Technology
Joris Proost (Universite catholique de Louvain, Bergium)
Morphological and electrical instabilities during anodic oxide growth
Sungmo Moon (Korea Institute of Materials Science, Korea)
Plasma electrolytic oxidation treatment of AZ31 Mg alloy
Sachiko Ono (Kogakuin University, Japan)
Growth mechanism of self-ordered porous anodic films on III-V semiconductors
Shinji Yae (University of Hyogo, Japan)
Metal-assisted etching of silicon: formation and control of porous structures
Mario G. S. Ferreira (University of Aveiro, Portugal)
Influence of the alumina barrier layer properties on electrodeposition of zinc from ionic liquids
Kenji Machida (Nippon Chemi-Con Corporation, Japan)
Highly Stable Transparent PEDOT film for Pt-Free Dye-Sensitized Solar Cells
Kazuyuki Nishio (Tokyo University of Technology, Japan)
Fabrication of Nanoporous Anodic Gold Oxide Films and Reduction to Nanoporous Gold Films
Hiroki Habazaki (Hokkaido University, Japan)
Formation of ZrO2-based Nanocomposite Anodic Films with High Capacitance
Chi-Chang Hu (National Tsing Hua University, Taiwan)
Electrochemical Deposition of TiO2 for Electrochemical Photocatalytic Decoloration of Dyes

The organizing committee invites you to submit one-page abstract for oral and poster presentations. Please send the abstract with your information form electronically via e-mail (), no later than December 15, 2013. Please use ideal preformatted templates (abstract and speaker information form), which can be downloaded from this site.

Download: Abstract Template (DOC) Download: Speaker Information Form (DOC)

Abstract book will be provided to participants at the commencement of the symposium.

15 December 2013 Abstract submission due
31 January 2014 Notification of abstract acceptance
15 March 2014 Early registration due
Chair
Hideki MASUDA (Tokyo Metropolitan University, Japan)
Honorary Chair
Hideaki TAKAHASHI (Asahikawa National College of Technology, Japan)
Co-chair
Ken SHIMIZU (Keio University & i-SEM laboratory, Japan)
Sachiko ONO (Kogakuin University, Japan)
Soo Gil PARK (Chungbuk National University, Korea)
Secretary general
Hiroki HABAZAKI (Hokkaido University, Japan)
International Scientific Committee
Francesco di QUARTO (Palermo University, Italy)
Kurt R. HEBERT (Iowa State University, USA)
Hiroki HABAZAKI (Hokkaido University, Japan)
Hideki MASUDA (Tokyo Metropolitan University, Japan)
Kemal NISANCIOGLU (Norwegian University of Science and Technology, Norway)
Sachiko ONO (Kogakuin University, Japan)
Soo Gil PARK (Chungbuk National University, Korea)
Patrik SCHMUKI (Erlangen University, Germany)
Ken SHMIZU (Keio University & i-SEM laboratory, Japan)
Hideaki TAKAHASHI (Asahikawa National College of Technology, Japan)
Herman TERRYN (Free University Brussel, Belgium)
George E. THOMPSON (The University of Manchester, UK)
Hidenori UCHI (Nippon Chemi-Con Corp., Japan)
Board Members of the Anodizing Research Society of Japan
Z. Ashitaka (Toyo Aluminum Co. Ltd)
H. Aso (Kogakuin Univ.)
S. Ito (Sakura Kurepas)
M. Iwasaki (Kinki Univ.)
K. Ui (Iwate Univ.)
H. Uchi (Nippon Chemi-con)
K. Ebihara (Nippon Light Metal)
S. Ono (Kogakuin Univ.)
N. Osawa (Sumitomo Light Metal)
H. kameyama (Tokyo Univ. Agriculture & Tech)
T. Kikuchi (Hokkaido Univ.)
M. Sakairi (Hokkaido Univ.)
H. Takahashi (ANCT)
S. Hasuo (Kyusyu Mitsui Aluminum)
T. Makino (Nippon Chemi-con)
I. Mizuki (Tokyo Metropolitan Univ.)
T. Yoshino (Chiba Univ.)
Local Organizing Committee
Yoshitaka AOKI (Hokkaido University, Japan)
Kazuhisa AZUMI (Hokkaido University, Japan)
Makoto CHIBA (Asahikawa National College of Tech., Japan)
Koji FUSHIMI (Hokkaido University, Japan)
Hiroki HABAZAKI (Hokkaido University, Japan)
Tatsuya KIKUCHI (Hokkaido University, Japan)
Masatoshi SAKAIRI (Hokkaido University, Japan)
Etsushi TSUJI (Hokkaido University, Japan)
Mikito UEDA (Hokkaido University, Japan)

i-SEM Laboratory

HORIBA Explore the future

OKUNO CHEMICAL INDUSTRIES CO., LTD.

JEOL

TOYO Corp.

HOKUTO DENKO

BEL Japan

NIPPON CHEMI-CON

LIXIL

UACJ

SystemBrain co.,ltd.

KURIMOTO

JCC: JAPAN CAPACITOR INDUSTRIAL CO.,LTD.

NIHON PARKERIZING CO.,LTD.

NLM: Nippon Light Metal Co.,Ltd

SHOWA DENKO

ebinax: Ebina Denka Kogyo Co.,Ltd.

NEC/TOKIN

HAYASAKA RIKOH

Download: Registration Form (DOC)

Registration fee

Registration Banquet
Before 15th March, 2014 After 16th March, 2014
Regular 35,000 JPY 40,000 JPY 10,000 JPY
Student 15,000 JPY 20,000 JPY 5,000 JPY
Accompanying person 10,000 JPY 10,000 JPY

If the applicant pay the registration fee through bank transfer, the applicant must pay all additional charges for making the remittance, including these service charges at the local bank and main bank in your country, also main bank in Japan, and our bank.

Cancellation fee

Before/on May 4, 2014 100% refund
During May 5 - May 28, 2014 20% refund
After May 29, 2014 no refund

All refunds will be processed after the conference and be assessed a 1,000 JPY cancellation fee.
All cancellation requests must be received at the symposium agency desk.

AST2014 Symposium Agency
Sapporo Urban Tourist Inc.
Yasushi Ota, Mr.
e-mail:

The venue (Chateraise Gateaux Kingdom Sapporo) is located at the northern end of Sapporo city, and it takes over 45 minutes by bus from central downtown Sapporo (the first bus leaves from Sapporo station at 9:00AM every day). Therefore, the organizing committee strongly suggests that all participants make a reservation for a room at Chateraise Gateaux Kingdom Sapporo through the symposium agency.

Download: Accommodation Form (DOC)

Accommodation fee (per night)

Conference hotel: Chateraise Gateaux Kingdom Sapporo Hotel & Spa Resort

Single use of twin room 12,500 JPY
Twin (per person) 7,000 JPY
Student room (large room, 3 or 4 students) 6,500 JPY

*All fees include breakfast.

Cancellation policy

Cancellation charge is as follows:

8 days before the check-in date free of charge
2-7 days before the check-in date 20%
the day before the check-in date 40%
On the check-in date, without notice 80%

Symposium Agency

Hotel reservation and payment are handled by Sapporo Urban Tourist Inc.
If you have any special wishes or requirements concerning accommodation, please contact the agency via e-mail.

AST2014 Symposium Agency
Sapporo Urban Tourist Inc.
Yasushi Ota, Mr.
e-mail:
Secretary General Hiroki HABAZAKI (Hokkaido University)
Assistant Tatsuya KIKUCHI (Hokkaido University)
Address
N13-W8 Sapporo 060-8628, Japan
Faculty of Engineering, Hokkaido University
e-mail:
Fax: +81-11-706-6575