AST2008

International Symposium on Anodizing Science and Technology

July 23-25, 2008, Rusutsu Resort & Convention, Hokkaido, Japan

Group photo for keysake
Click to enlarge (1.01MB)

Scope

The International Symposium on Anodizing Science and Technology, co-organized by Anodizing Research Society (ARS) and Japanese Anodizing Association of The Surface Finishing Society of Japan and Committee of Capacitor Division of the Korean Electrochemical Society, focuses on various aspects of anodizing science and technology.

Currently, anodic oxide films, particularly porous type films on aluminum and titanium, have attracted much attention in connection with nanoscience and nanotechnology.

This international symposium is organized, following a very successful Korea-Japan Joint Symposium held at Jeju last year, organized by Capacitor Division of Korean Electrochemical Society and ARS.

The aim of this symposium is to provide up-to-date forum on anodizing science and technology, and to discuss the future prospect of this area.

The main topics of this symposium are as follows:

  1. Fundamental understanding of formation, structure and properties of anodic oxides on various metals
  2. Control of structure and morphology of anodic oxides
  3. Self-organization of porous oxide films on aluminum and other valve metals
  4. High resolution analysis of anodic oxide films
  5. Micro- and nano-technologies of anodic oxides
  6. Various applications of anodic oxides, including capacitors, catalysis, photocatalysis and corrosion and wear protection
  7. Science and technology related to anodizing; electrochemical etching and polishing, passivity, electrochemical energy storage and conversion

Venue

The symposium will be held at Rusutsu Resort Hotel & Convention, Hokkaido, Japan.

Rusutsu Resort is only a 90-minutes car ride from Sapporo and New Chitose Airport, Tomakomai and Muroran, making it perfectly located for those traveling by plane or ferry.

Rusutsu Resort Hotel & Convention

  • 13, Aza Izumikawa, Rusutsu-mura, Abuta-gun, Hokkaido 048-1711, Japan
  • Tel: +81-136-46-3331(representative)
  • Fax: +81-136-46-3229

Program

23rd July

12:30 The organizers welcome the participants at New Chitose Airport.
Symposium bus is arranged for participants to move from the airport to the symposium hotel via National Park (Toya caldera lake, Mt. Usu and Showashinzan).
17:00 Arrival at symposium hotel (Rusutsu resort hotel & convention)
Check in & Registration
18:30 Welcome reception

24th July

8:45 Opening Address (Chair: H. Habazaki)

Penary Sessions: (Chair: G. E. Thompson)

9:00 Plenary: F. Di Quarto (Palermo University)
Anodizing science and technology: achievements and perspectives. A personal view
9:45 Coffee break

Session: Barrier-type anodic oxides and their capacitor applications (Chairs: A. W. Hassel & H. Takahashi)

10:00 M. M. Lohrengel (University of Duesseldorf)
Ionic and electronic conductivity of anodic oxide films of Ta
10:30 S. Ono (Kogakuin University)
Effect of nitrogen doping on dielectric property of anodic films formed on valve metals
11:00 J. Koenitzer (Cabot Supermetals, Co. Ltd.)
A new era for high CV/g tantalum powders
11:30 K. Ueno (Nippon Chemi-con, Co. Ltd.)
Study of the Interface between Ta Anodic Oxide Film and Conductive Polymer PEDOT
12:00 Lunch

Session: Porous anodic oxides (Chairs: M. M. Lohrengel & S. Ono)

13:30 P. Schmuki (University of Erlangen-Nuremberg)
Anodization of Ti: Self-organizing TiO2 nanostructures (nanotubes, nanobamboo, nanolace)
14:00 K. Hebert (Iowa State University)
Growth mechanisms of porous anodic alumina
14:30 H. Kameyama (Tokyo University of Agriculture and Technology)
Hydrogen production from bioethanol with an alumite catalyst
15:00-16:30 Poster Session

Session: Fundamentals of anodic film formation (Chairs: K. Hebert & Y. Tak)

16:30 G.E. Thompson (The University of Manchester)
Graded anodic oxide films on aluminium alloys for aerospace applications
17:00 H. Terryn (Vrije Universiteit Brussel)
Experimental Study and Modelling of Heat Transfer during Anodizing in a Wall-Jet Electrode Set-up
17:30 K. Shimizu (Keio University)
Anodizing - revisited
19:00 Banquet

25th July

Session: Etching and Passivity (Chairs: P. Schmuki & H. Masuda)

8:45 Y. Ogata (Kyoto University)
Pore formation in silicon and the pore filling
9:15 Y. Tak (Inha University)
Surface Area Control of Aluminum Etched Foil
9:45 A.W. Hassel (Max-Planck-Institut für Eisenforschung)
Tailoring of nanostructured alloys by anodisation
10:15 Coffee break

Session: Applications (Chairs: H. Terryn & H. Uchi)

10:30 S. Park (Chungbuk University)
Electrochemical hybrid capacitor based on nano carbon & metal oxide composite electrodes
11:00 K. Kim (Yonsei University)
Transition metal oxide nanocomposites for electrochemical capacitors
11:30 S. Moon (Korea Institute of Materials Science)
Wear resistive coating on aluminium using micro-arc oxidation method
12:00 Lunch

Session: Micro- and nano-technology (Chairs: S. Park & K. Shimizu)

13:30 H. Masuda (Tokyo Metropolitan University)
Functional nanodevices using anodic porous alumina
14:00 M. Iwasaki (Kinki University)
Flip-flop phenomenon of noble metal nanorods deposited in porous anodic alumina
14:30 H. Takahashi (Asahikawa College of Technology)
Micro- and nano-technologies based on anodizing of aluminum
15:15 Closing remarks

Bus will leave the hotel for New Chitose Airport at 15:30. The arrival time at the airport is estimated to be 17:30.

Poster Presentations

P01:Formation of porous aluminum films by PVD for electrolytic capacitor application – Takashi Fujii, Yoshitaka Aoki, Koji Fushimi, Hiroki Habazaki (Hokkaido University), Takeshi Makino, Shoji Ono (Nippon Chemi-Con)

P02: Effect of boron incorporation on dielectric properties of crystalline anodic oxide films formed on aluminum - Ken Hashimoto, Hidetaka Asoh, Sachiko Ono (Kogakuin University)

P03:Generation and basic characteristics of dielectric barrier discharge using anodic porous alumina in atmospheric pressure air - Toshiyuki Kawasaki (Nippon Bunri University)

P04:Dielectric properties of anodic oxide films formed on niobium in ammonium alkaline electrolytes - Kazuko Nishimura (Kogakuin University), Kazuhiro Nagahara, Hideaki Takahashi (Hokkaido University), Hidetaka Asoh, and Sachiko Ono (Kogakuin University)

P05:Formation of porous niobium films by oblique angle deposition: influences of deposition angle and substrate morphology – M. Tauseef Tanvir, Y. Aoki and H. Habazaki (Hokkaido University)

P06:Unlimited growth of crystalline anodic oxide films on niobium - Masao Hori, Hidetaka Asoh and Sachiko Ono (Kogakuin University)

P07:Fabrication of microporous alumina with large pore interval more than 1 µm - Hidetaka Asoh, Kota Uchibori, Masahiro Nakamura, and Sachiko Ono (Kogakuin University)

P08:Formation of titanium dioxide nanotubes by anodization method – Sungmo Moon and Yongsoo Jeong (Korea Institute of Materials Science)

P09:Functionalization of anodic TiO2 nanotubes – Hiroaki Tsuchiya, Yuji Shinkai (Osaka University), Patrik Schumki, Doohun Kim (University of Erlangen-Nuremberg), Shinji Fujimoto (Osaka University)

P10:Morphological variation of TiO2 nanotube prepared by anodization – Kiyoung Lee, Jiyoung Kim, Hyeyoung Kim and Yongsug Tak (Inha University)

P11:Ordered Ni and Au nanocones with 100 nm intervals using a porous anodic alumina film – Tomota Nagaura, Kenji Wada, Satoru Inoue (National Institute for Materials Science, University of Tsukuba)

P12:Electronic behavior of amorphous anodic Nb2O5 nanofilms in ambient gas atmospheres – Damian Kowalski, Yoshitaka Aoki, and Hiroki Habazaki (Hokkaido University)

P13:Surface oxide film on Pt-Co or Pd-Co PEFC cathode electrodes - Yuichi Tamura, Kento Taneda, Mikito Ueda and Toshiaki Ohtsuka (Hokkaido University)

P14:Development of pH sensitive film using porous anodic oxide film of Al - Fumiyasu Nishiyama, Hidetaka Konno and Kazuhisa Azumi (Hokkaido University)

P15:Pd/γ-alumina graded layer formed in Pd/γ-alumina/alumite composite membrane for durability of hydrogen permselective membrane – Masahiro Seshimo, Minoru Ozawa (Tokyo University of Agriculture and Technology), Masato Sone (Tokyo Institute of Technology), Makoto Sakurai, Hideo Kameyama (Tokyo University of Agriculture and Technology)

P16:Development of high performance dehydrogenation catalyst using anodic oxide films on aluminum - Guangbin Zhou, Masatoshi Sugimasa, Atsushi Shimada, Takao Ishikawa (Hitachi)

P17:The application of alumite catalysts in deodorization system for biomass derived – Dong Vien Vo, Yuzuru Takahashi, Mariko Kanehira, Lifeng Wang, Thanh Phong Tran, Makoto Sakurai, Hideo Kameyama (Tokyo University of Agriculture and Technology)

P18:Metallization of oxide /hydroxide film of aluminum: the palladium activation techniques - Himendra Jha, Tatsuya Kikuchi, Masatoshi Sakairi (Hokkaido University) and Hideaki Takahashi (Asahikawa National College of Technology)

P19:Self-regenerative activity of plate-type anodic alumina supported nickel catalysts Ni/NiAl2O4/γ-Al2O3/alloy with trace Ru during daily start-up and shut-down operation of methane steam reforming - Lu ZHOU, Yu GUO, Qi ZHANG, Hua Bo Li, Makoto SAKURAI, and Hideo KAMEYAMA (Tokyo University of Agriculture and Technology)

P20:Plate-type anodic alumina supported ruthenium catalysts for steam reforming of kerosene – HuaBo Li, Yu Guo, Lu Zhou, Jian Chen, Makoto Sakurai and Hideo Kameyama (Tokyo University of Agriculture and Technology)

P21:Diffusion limiting-current equation in the flowing-type droplet cell - Shunsuke Yamamoto, Koji Fushimi, Hiroki Habazaki, and Hidetaka Konno (Hokkaido University)

P22:Combinatorial microelectrochemistry with a scanning droplet cell on binary and ternary Ti, Ta and Hf alloys – Andrei Ionut Mardare (Max-Planck-Institut für Eisenforschung GmbH), Alfred Ludwig, Alan Savan, Andreas Dirk Wieck (Ruhr-Universität Bochum), Achim Walter Hassel (Max-Planck-Institut für Eisenforschung GmbH)

P23:Formation of preferentially oriented ZnO layer by electrochemical method – Hyeyoung Kim, Yunkyoung Jo, Kiyoung Lee, Yongsug Tak (Inha University)

P24:Evaluation of photocatalytic activity of nanoporous ZnO films prepared by Anodization - Yuta Kobayashi, Hidetaka Asoh and Sachiko Ono (Kogakuin University)

P25:Spark anodizing of titanium and its alloys in alkaline aluminate solution - Miho Nakajima, Yoshiyuki Miura, Koji Fushimi, Masayuki Takazawa, Hiroki Habazaki (Hokkaido Univ.)

P26:Characterization of technical conversion layers by spectroscopy and electrochemistry - S. Satinskaya, M. M. Lohrengel (University of Duesseldolf)

P27:Chemical conversion treatment for high corrosion resistivity on AZ31B magnesium alloy – Kohei Isobe, Takayuki Naito, Kazuma Miura, Akihiro Yamada, Yasunori Kobayashi (Industrial research Institute of Niigata prefecture)

P28:Characterization of alkaline dissolution of anodic oxide films formed on aluminum by EIS – Yukio Honkawa (Furukawa-Sky Aluminum Corp.), Takahiro Mizutani (Nagoya University), Tokuhiko Kobayashi, Yoichi Kojima (Furukawa-Sky Aluminum Corp.), and Masazumi Okido (Nagoya University)

P29:GDOES depth profiling analysis of thin passive films on molybdenum-containing stainless steel – Motonori Uemura, Takatoshi Yamamoto, Yoshitaka Aoki, Koji Fushimi, Hiroki Habazaki (Hokkaido University)

P30:Photoluminescence from passive films on Ni by photo-excitation of UV light - Yusuke Mito, Mikito Ueda, and Toshiaki Ohtsuka (Hokkaido University)

P31:Fracture of anodized Al-Li alloy with cracks in the coating by fatigue tests - Toshiro Fukushima (Fukushima Material Engineering Laboratory)

P32:Repassivation behavior of passive film on pure iron in borate buffer solution investigated by micro-indentation – Takatoshi Yamamoto, Koji Fushimi, Hiroki Habazaki, Hidetaka Konno (Hokkaido University)

Language

The official language of the symposium is English.

Important dates

  • 31st May 2008: Abstract submission due
  • 20th June 2008: Early registration due

Call for Papers

The organizing commettee invites you to submit one-page abstracts of proposed *poster* presentations related to anodizing science and technology.

Please use the abstract template, which can be downloaded from this site.

Please send one page abstract to ast2008(at)eng.hokudai.ac.jp by 31 May 2008.

Best Poster Awards

The posters with excellent technical content, appearance and presentation quality will be awarded to encourage young scientists, including students, and engineers in this field.

Proceedings of AST2008

We are happy to let you know that the Proceedings of AST2008 will be published as a special issue of “Corrosion Science” and also as a special issue of “Journal of the Surface Finishing Society of Japan (JSFSJ)”. We would like to invite you to submit a manuscript to either Corrosion Science or JSFSJ. The submitted manuscripts will undergo the usual journal's standard refereeing procedure for inclusion in the special issue of each journal.

The papers studying fundamentally on growth, structure and degradation of anodic oxide films will be able to publish in Corrosion Science, whereas JSFSJ will be suitable for publication of the applied research of anodic oxide films. The papers must be written in English, but the papers written in Japanese are also acceptable for publication in JSFSJ.

Points of note

  • The deadline for manuscript submission is 23rd August 2008.
  • The authors are requested to inform the title and brief abstract of the paper to Hiroki Habazaki ( ast2008(at)eng.hokudai.ac.jp ) by 23rd July 2008. Then, details of the manuscript submission will be informed to each author.
  • The paper must be the authors' original, unpublished work. For submission in Corrosion Science, a critical review, which do full justice to the literature and are not simple references to the authors' own published works, will be also acceptable.
  • When preparing your manuscript please carefully follow the journal's Guide to Authors, which you can find on the following sites:

Organizers

Chair

  • Hideaki TAKAHASHI (Hokkaido University, Japan)

Co-chair

  • Soo Gil PARK (Chungbuk University, Korea)

Scientific Committee

  • Kurt HEBERT (Iowa State University, USA)
  • Soo Gil PARK (Chungbuk University, Korea)
  • Yongsung TAK (Inha University, Korea)
  • Herman TERRYN (Free University Brussel, Belgium)
  • George E. THOMPSON (The University of Manchester, UK)

Local Organizing Committee

Registration & Accommodation

Please download the Registration & Reservation form and send it to the symposium agency.

AST2008 Registration

Registration fee

Advanced registration fees (by 20 June 2008) Late registration fees (after 21 June 2008)
Student ¥10, 000 ¥15, 000
Academia* ¥30,000 ¥35,000
General ¥40,000 ¥45,000
Special corporate fee
(up to 4 participants)
¥140,000
Accompanying person ¥15,000

* University and National Institute employees.

Registration fees include abstract book, welcome reception, banquet and coffee break. Lunch (24th and 25th July) is also included.

Cancellation fee

Before/on 20 June; during 21 June - 15 July; after 16 July;
100 % refund 20 % refund no refund

All refunds will be processed after the conference and be assessed a ¥1,000 cancellation fee.

All cancellation requests must be received at the symposium agency desk, c/o Sapporo Express Co. Ltd., Travel Service Branch:

  • Phone: +81-11-251-1166
  • Fax: +81-11-210-6586 (recommended)
  • E-mail: y-ota@sattsu.co.jp

Accommodation

Accomodation fee

Conference hotel: Rusutsu resort hotel.

Accomodation fee (per night)
Single use of twin room ¥14,700
Twin (per person) ¥11,550
Family room sharing 3 or 4 members ¥9,450
Lodge for students (per person) ¥8,400

Accommodation fees include breakfast.

Cancellation and change of hotel reservation

Cancellation and charges are as follows:

9-1 days prior to check-in date The day of check-in Without notice
20% 80% 100%

Hotel accommodation is arranged by Sapporo Express Co. Ltd., Travel Service Branch.

All cancellation or change of hotel reservation requests must be noticed by e-mail or fax.

Travel information

Access between New Chitose Airport and the symposium hotel.

  • On 23rd July, a symposium bus (free of charge) is arranged to access from New Chitose Airport to Rusutsu Resort Hotel & Convention, where the symposium is held. The bus will leave the airport at 12:30 (Meeting place is here). On the way, the bus stops in Shikotsu-Toya National Park where you could enjoy beautiful landscape.
  • After the symposium a bus leaves 15:30 the hotel for the airport on 25th July (fare: 2,000JPY).
  • If you are not able to utilize the symposium bus, a bus connecting directly between the airport and the symposium hotel is available (a single fare: 2,000JPY). Reservation is necessary by 15th July. For reservation, please contact us (ast2008>at<eng.hokudai.ac.jp) as early as possible. The time table is as follows.

    from New Chitose Airportto Rusutsu
    9:15 11:15
    11:30 13:30
    12:30 14:30
    13:30 15:30
    14:10 16:10
    15:30 17:30
    17:30 19:30
    21:30 23:30
    from Rusutsu to New Chitose Airport
    8:30 10:30
    9:20 11:20
    10:30 12:30
    14:20 16:20
    16:35 18:35
  • The bus connection between Sapporo and the hotel are as follows (a single fare: 2,040JPY). Reservation is also needed.
    from Sapporoto Rusutsu
    8:009:54
    9:2011:14
    10:5012:44
    12:1014:04
    14:1016:04
    16:2018:14
    17:4019:39
    21:3023:30
    from Rusutsuto Sapporo
    7:479:54
    8:5110:50
    10:1112:10
    12:1614:15
    13:4615:45
    16:2118:28
    17:4119:40

Symposium Agency

Registration, hotel reservation and payment are handled by Sapporo Express Co. Ltd., Travel Service Branch in Sapporo.

If you have any special wishes or requirements concerning accommodation, please contact the agency via e-mail or FAX:

AST2008 Symposium Agency

  • c/o Sapporo Express Co. Ltd., Travel Service Branch
  • Sattsu Building 2F, Kita 5-jo, Nishi 6-chome, Chuo-ku, Sapporo 060-0005, Japan
  • Phone: +81-11-251-1166
  • Fax: +81-11-210-6586
  • E-mail: y-ota@sattsu.co.jp (Yasushi Ota, Mr.)